The formation of copper germanium alloys by the low temperature atomic hydrogen treatment

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Authors: Kazimirov A. I., Erofeev E. V., Kagadey V. A.

Annotation: In the article we investigated the behavior of the two-layer thin-film Cu/Ge system deposited on i-GaAs substrate at its treatment in atomic hydrogen. It was discovered, that such processing in an atomic hydrogen flow with density 10^15 at.·cm2·s–1 at room temperature for 5 min leads to the solid state interdiffusion of Cu and Ge thin films and polycrystalline CuGe alloy formation with the vertically oriented grains.

Keywords: thin films, copper germanium alloy, atomic hydrogen, diffusion, sheet resistance

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