The investigation of the nonlinear behavior of the drain resistance in GaN HEMT and GaAs pHEMT

Download article in PDF format

Authors: Kokolov A. A., Babak L. I.

Annotation: In this work a new analytical technique for bias-dependent drain resistance R d extraction is proposed. The dependences of the resistance R d vs. applied drain-source voltage V ds and gate-source voltage V gs for domestic 0.15 um GaN HEMT and 0.15 um GaAs pHEMT transistors are obtained. Small signal model with non-linear R d allowed to specify the value of other internal elements and to improve the accuracy of the S-parameter.

Keywords: small signal model, hemt, drain resistance

Viktor N. Maslennikov

Executive Secretary of the Editor’s Office

 Editor’s Office: 40 Lenina Prospect, Tomsk, 634050, Russia

  Phone / Fax: + 7 (3822) 51-21-21 / 51-43-02

  vnmas@tusur.ru

Subscription for updates