Review of test structures intended for measurement of electrophysical parameters of materials in MMIC technology

Download article in PDF format

Authors: Salnikov A. S., Yuschenko A. Yu.

Annotation: The paper reviews the different test structures and techniques, which allow to determine electrophysical parameters of materials used in MMIC process control and development. The necessity of parametric testing is substantiated. Test structures for measurement of the sheet resistance, contact resistance, concentration and mobility of charge carriers are given.

Keywords: microelectronics, microwaves, mmic, electrophysical parameters, test structure, measurement, parametric test, technology test

Editorial office address

Executive Secretary of the Editor’s Office

 Editor’s Office: 40 Lenina Prospect, Tomsk, 634050, Russia

  Phone / Fax: + 7 (3822) 701-582

  journal@tusur.ru

 

Viktor N. Maslennikov

Executive Secretary of the Editor’s Office

 Editor’s Office: 40 Lenina Prospect, Tomsk, 634050, Russia

  Phone / Fax: + 7 (3822) 51-21-21 / 51-43-02

  vnmas@tusur.ru

Subscription for updates