Modeling the influence of heterostructure barrier layer thickness on the breakdown voltage of high electron mobility transistor

Download article in PDF format

Authors: Shesterikova D. A., Shesterikov A. E., Erofeev E. V., Troyan P. E.

Annotation: The paper presents the results of modeling the breakdown occurrence in the heterostructure of a high electron mobility transistor at different thicknesses of the AlGaAs barrier layer. As a result of the study, it was revealed that the breakdown voltage, measured by the drain current injection method, is 8,75 V at the specified parameters of the heterostructure and remains unchanged when the thickness of the barrier layer changes

Keywords: barrier layer, drain current injection, phemt, heterostructure, breakdown voltage

Editorial office address

Executive Secretary of the Editor’s Office

 Editor’s Office: 40 Lenina Prospect, Tomsk, 634050, Russia

  Phone / Fax: + 7 (3822) 701-582

  journal@tusur.ru

 

Viktor N. Maslennikov

Executive Secretary of the Editor’s Office

 Editor’s Office: 40 Lenina Prospect, Tomsk, 634050, Russia

  Phone / Fax: + 7 (3822) 51-21-21 / 51-43-02

Subscription for updates