Electric formation and disruptive discharge of thin-film structures of a metal-insulator-metal type
DOI: 10.21293/1818-0442-2017-20-3-152-154
Abstract: In this particular work, based on the analysis of experimental and calculated data on processes of disruptive discharge and electric formation of thin-film dielectrics, are installed general regularities of physical processes and differences in the appearance of breakdown and electrical formation of thin-film dielectrics in a metal-insulator-metal structure.
Keywords: electric formation, disruptive discharge, mim-structure, amorphous dielectric, emission
For citation:
Troyan P. E., Karanskiy V. V. Electric formation and disruptive discharge of thin-film structures of a metal-insulator-metal type. Doklady Tomskogo gosudarstvennogo universiteta sistem upravleniya i radioelektroniki, 2017, vol. 20, no. 3, pp. 152–154. DOI: 10.21293/1818-0442-2017-20-3-152-154
Authors and copyright holders:
- Troyan P. E. , Tomsk State University of Control Systems and Radioelectronics (Tomsk, Russia)
- Karanskiy V. V.
—
Last issue
-2026-1_%D0%BA%D0%BE%D0%BF%D0%B8%D1%8F.jpg)
Editorial office address
Executive Secretary of the Editor’s Office
Editor’s Office: 40 Lenina Prospect, Tomsk, 634050, Russia
Phone / Fax: + 7 (3822) 701-582
Viktor N. Maslennikov
Executive Secretary of the Editor’s Office
Editor’s Office: 40 Lenina Prospect, Tomsk, 634050, Russia
Phone / Fax: + 7 (3822) 51-21-21 / 51-43-02
Subscription for updates
