Fabrication of microrelief by electron beam lithography and contact photolithography

Abstract: In the paper we observed the possibility of fabrication of microrelief surfaces in the optical SiO₂ coating which was applied on a solid state base coat. We used two methods of delineation in the SiO₂ layer for fabrication of microrelief with regular structure – electron beam lithography and contact photolithography. The microrelief in the SiO₂ layer (with the cavity diameter of 460 nm and stepping distance of 130 nm with density of 2,8·10⁸ pcs./cm²) was received by electron beam lithography. The microrelief of nanotips (with a diameter of 630–660 nm and stepping distance of 415 nm which correspond to density of 3,3·10⁷ pcs./cm²) was received by contact photolithography.

Keywords: optical coating, quantum efficiency, microrelief, electon beam lithography, photolithography

For citation:
Grebneva Yu. Yu., Danilina T. I., Moshkina A. V., Chistoedova I. A. Fabrication of microrelief by electron beam lithography and contact photolithography. Doklady Tomskogo gosudarstvennogo universiteta sistem upravleniya i radioelektroniki, 2012, no. 2(26), – p. 2. pp. 175–178.