Simulating of etching process using «NEMO etching» software

Download article in PDF format

Authors: Muhamadeev R. A., Danilina T. I.

Annotation: This paper is about simulating of etching process using «NEMO etching» software. We investigated the essential etching models in the microelectronics, nanoelectronics, and microelectromechanical systems. The results of wet etching, ion milling, reactive ion etching, and Bosch process simulating on different condition are shown in the paper. The simulation data are checked for compliance with real experiments

Keywords: etching, simulation software, reactive ion etching, ion milling, isotropic etching, bosch-process