Abstract: This paper is about simulating of etching process using «NEMO etching» software. We investigated the essential etching models in the microelectronics, nanoelectronics, and microelectromechanical systems. The results of wet etching, ion milling, reactive ion etching, and Bosch process simulating on different condition are shown in the paper. The simulation data are checked for compliance with real experiments
Keywords: etching, simulation software, reactive ion etching, ion milling, isotropic etching, bosch-process
Authors and copyright holders:
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For citation:
Muhamadeev R. A., Danilina T. I. Simulating of etching process using «NEMO etching» software. Doklady Tomskogo gosudarstvennogo universiteta sistem upravleniya i radioelektroniki, 2014, no. 1(31), pp. 95–98.
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