Gas-metal e-beam-produced plasma for oxide coating deposition at fore-vacuum pressures
DOI: 10.21293/1818-0442-2016-19-4-10-12
Abstract: This article describes an experiment on the deposition of oxide coatings on silicon and metal substrates from a gasmetal plasma. The plasma was produced by e-beam evaporation of metals (Mg, Al) with subsequent ionization of gas (oxygen) and evaporated material particles at fore-vacuum (1–10 Pa) pressures. We studied the ion composition and species fraction in the gas-metal plasma (using quadruple mass-spectrometry), as well as the thickness and surface resistivity of the coatings.
Keywords: fore-vacuum, plasma-cathode electron source, coating deposition
For citation:
Zolotuhin D. B., Burdovitsin V. A., Oks E. M., Tyunkov A. V., Yushkov Yu. G., Braun Ya. G. Gas-metal e-beam-produced plasma for oxide coating deposition at fore-vacuum pressures. Doklady Tomskogo gosudarstvennogo universiteta sistem upravleniya i radioelektroniki, 2016, vol. 19, no. 4, pp. 10–12. DOI: 10.21293/1818-0442-2016-19-4-10-12
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