Electron beam evaporation of alumina ceramics at forevacuum pressures

Annotation: The paper presents research results on electron beam evaporation and vapor deposition of alumina ceramics using a plasma electron source designed specially for operation at forevacuum pressures. The deposited coating thickness is analyzed depending on the distance to the evaporated target and on the angle between the beam axis and the direction to the substrate center. It is shown that in the forevacuum pressure range, the spatial distribution of the coating thickness is more uniform compared to deposition in high vacuum. This fact can be associated with dispersion of evaporated material particles at gas molecules.

Keywords: electron beam evaporation, plasma electron source, forevacuum pressure range, dielectric surface charging