Abstract: A physical method to obtain porous oxide films in vacuum conditions is proposed. The structure and the properties of the porous films obtained by self-organization during magnetron sputtering the composite target are investigated. Correlations between the quantity and size of the pores, as well as the structure and properties of porous films are established.
Keywords: porous films, silicon dioxide, tantalum pentoxide, carbon
For citation:
Saharov Yu. V., Troyan P. E., Zhidik Yu. S. The technology of synthesis and properties of porous oxide films. Doklady Tomskogo gosudarstvennogo universiteta sistem upravleniya i radioelektroniki, 2015, no. 4(38), pp. 72–75.
Authors and copyright holders:
- Saharov Yu. V.
- Troyan P. E. , Tomsk State University of Control Systems and Radioelectronics (Tomsk, Russia)
- Zhidik Yu. S.
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