Formation technology of LED heterostructure coating by magnetron sputtering on the example of ITO film application

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Authors: Zhidik Yu. S., Troyan P. E.

Annotation: The article provides a study of the effectiveness removal of charged particles from the substrate and the growing ITO film deposition by reactive magnetron sputtering using different deflection system. It is found that the use of magnetic outlet system has reduced the energy of electrons reaching the substrate up to five times, and the concentration of charged particles to thirteen times, while it is shown that ITO film, sprayed under these conditions grow without defects.

Keywords: ito, magnetron sputtering, electron implantation of the substrate