New possibilities of applying fore-vacuum plasma sources in technological processes of electron-beam treatment of dielectric materials
DOI: 10.21293/1818-0442-2017-20-3-70-75
Abstract: The paper presents the results of the application of fore-vacuum plasma electron sources obtained during the last year. Such applications include: generation of beam plasma in a dielectric cavity, evaporation of various materials with subsequent deposition of coatings, dimensional processing of dielectric materials.
Keywords: plasma electron source, fore-vacuum, beam plasma, dielectric cavity, evaporation of materials, deposition of coatings, electron beam milling
For citation:
Burdovitsin V. A., Zolotuhin D. B., Zenin A. A., Oks E. M., Tyunkov A. V., Yushkov Yu. G. New possibilities of applying fore-vacuum plasma sources in technological processes of electron-beam treatment of dielectric materials. Doklady Tomskogo gosudarstvennogo universiteta sistem upravleniya i radioelektroniki, 2017, vol. 20, no. 3, pp. 70–75. DOI: 10.21293/1818-0442-2017-20-3-70-75
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