Ion-plasma methods to obtain nanostructures
DOI: 10.21293/1818-0442-2017-20-3-40-45
DOI: 10.21293/1818-0442-2017-20-3-40-45
Abstract: The article presents up-to-date results of scientific and technical activities by TUSUR scientific school investigating to the methods to obtain nanostructures using ion-plasma deposition technology. This research team originated under the direction of G. A. Vorobyev in the year of 1970. The results of the carried out research in this field are presented, as well as the information on their introduction into microelectronics produc- tion in the form of nanolayers for various purposes.
Keywords: ion-plasma spraying, magnetron sputtering system, penning system, dielectric, resistive and conductive nanostructures
Authors and copyright holders:
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For citation:
Danilina T. I., Troyan P. E., Saharov Yu. V., Zhidik Yu. S. Ion-plasma methods to obtain nanostructures. Doklady Tomskogo gosudarstvennogo universiteta sistem upravleniya i radioelektroniki, 2017, vol. 20, no. 3, pp. 40–45. DOI: 10.21293/1818-0442-2017-20-3-40-45
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